Hunan Ultra Minor Metals Ltd.
Hunan Ultra Minor Metals Ltd.
🇨🇳 China, Hunan
2009101-200 peopleManufacturer/Trading CompanyHunan Ultra Minor Metals Ltd. (UMM) is a specialized technology enterprise and manufacturer based in Changsha, China, dedicated to the research, development, and production of ultra-high purity rare and refractory metals. Established in the early 2000s, the company operates a massive production base featuring over ten specialized production lines and an Ultra Purity Refractory Metals Materials R&D Centre. UMM is a recognized innovator in the field, particularly for its proprietary technology in producing rhenium powder with purity levels reaching 99.999% and controlled particle sizes of 1-2 µM. Their comprehensive product portfolio includes high-purity sputtering targets (Tungsten, Titanium, Ruthenium, Iridium, and Osmium), spherical and nano powders for additive manufacturing, and various refractory metal alloys involving Tantalum, Niobium, and Molybdenum. The company serves a diverse range of high-tech industries globally, including aviation, aerospace, metallurgy, petrol-chemistry, and military sectors. With a workforce of approximately 100 to 200 employees and significant R&D capabilities, UMM provides customized material solutions, intermediate materials, and ODM services to meet the stringent requirements of advanced manufacturing and electronic film applications.
ODM manufacturerProvides ODM design and manufacturing solutions.
Own brandOwns and operates its own brands and manufacturing facilities.
Product customizationOffers full customization for design and features.
High-tech enterpriseRecognized as a high-tech or innovative enterprise.
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High Purity Pure Ruthenium Sputtering Target for Thin Film Industry
High Purity Pure Iridium Sputtering Target for Thin Film Industry
High Purity Osmium Target Sputtering Target for Thin Film Industry
High Purity Pure Titanium Sputtering Target for Thin Film Industry
High Purity Titanium Target, 99.995% Titanium Ti Sputtering Target for Vacuum Coating
High Purity 4n Tungsten Titanium Target, 99.99% Wti10 Wti20 Sputtering Target
High Purity 5n 99.999% Tungsten Sputtering Target for Thin Film Industry
High Purity Tungsten Nickel Chromium/Nickel Chromium/ Tungsten Nickel Sputtering Target for Thin Film Industry
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MARITIMA VALPARAISO CHILE
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Patented technology
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Description
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