High Purity Iridium Granules D3 D6 for Coating and Fabrication Iridium Pellets$195
High-Purity Tantalum Sheet ASTM B708 RO5200 for Industrial Use$35
Annealing Vanadium Foil 0.1mm High Purity 99.95% Customized Size Metal Foil$720
High Purity Aluminum Titanium Sputtering Material for PVD Coating$50
Premium 99.9% Titanium Aluminum Alloy Targets for Coating$35
JiangXi HUI NAN New Material Technology Co.,Ltd
🇨🇳 China
2017101-200 peopleTrading Company
Patented technology
High-tech enterprise
Eco-friendly supplier
High product rating
Key market
North America
Review
5
Description
JiangXi HUI NAN New Material Technology Co.,Ltd is a specialized supplier of surface treatment materials based in Ji'an, China. Founded in 2004, the company has established itself as a significant player in the chemical industry, focusing on the sales and development of electroplating additives, electrophoretic coatings, and metal finishing materials. The company operates from a 30,000 square meter modern production base in the WanAn Chemical Control Park, which features large-scale production plants and comprehensive R&D quality inspection facilities. Their extensive product portfolio includes nickel and copper brighteners, electroless nickel, zinc plating solutions, gold and silver plating additives, and various electrophoretic lacquers. With a workforce of 101 to 200 employees and an annual revenue between US$50 million and US$100 million, the firm maintains a strong international trading platform. JiangXi HUI NAN New Material Technology Co.,Ltd holds ISO9001, ISO14001, and IATF16949 certifications, reflecting a commitment to quality management and environmental standards. The company collaborates with domestic and foreign R&D institutes to continuously upgrade its innovative technologies for the global surface treatment market.
High Performance 22023Acid Copper Brightener Synthesis Material Intermediates High Speed Acid Copper Plating Additive$7
EPOXI COATING Electrophoresis Coating Liquid Epoxy Primer for Cars and Boats Anodic and Cathodic Deposition Both$3